Description

The demand for cleanliness in wafer transfer devices is rapidly increasing with advances in semiconductor manufacturing technology. A nitrogen charger provides a controlled environment for pod devices, as wafers are transferred from one station to another. This work simulates the flow field in a standard mechanical interface (SMIF) pod during charging with nitrogen using a commercial computational fluid dynamics (CFD) code. The calculation results include the pressure, velocity, and nitrogen concentration distributions inside the SMIF pod. Characteristic parameters influencing the flow field are discussed and optimized. Numerical results reveal that a larger inert gas charging angle and a limited charging rate can effectively reduce the charging period needed to expel air initially inside the pod. The charging efficiency can also be improved by enlarging the distance between the charging inlet and discharging outlet and by expanding the gas passage width near the charging side. Results in this study provide a valuable reference for designing effective nitrogen-charging devices.

Units: SI

Citation: ASHRAE Transactions, vol. 107, pt. 2

Product Details

Published:

2001

Number of Pages:

7

File Size:

1 file , 540 KB

Product Code(s):

D-7113